A university laboratory of materials, microelectronics and biology applied the PT13MBE Plasma Cleaner for wafer cleaning, microfluidic activation, polymer modification and optical pretreatment. The machine adopts 13.56MHz RF automatching power supply with 0–200W adjustable power, generating lowtemperature highdensity plasma to achieve green dry treatment under <10Pa high vacuum.

In actual use, the system reaches stable gas in about 40 seconds and performs cleaning, photoresist removal, etching and surface activation on silicon, PET, PDMS, ceramic and glass substrates. After oxygen plasma treatment, cell culture dishes show improved hydrophilicity; chip pads get higher bonding strength; optical lenses achieve better coating adhesion. The lowtemperature feature avoids thermal damage, and onekey operation ensures stable and safe running.

Longterm application proves PT13MBE efficiently removes organics, boosts surface energy and enhances bonding, supporting R&D in semiconductor, biomedical and nanomaterial fields.

Core Operating Parameters